The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Apr. 20, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Sze Chieh Tan, Singapore, SG;
Vicknesh Sahmuganathan, Singapore, SG;
Christian W. Valencia, Alhambra, CA (US);
Thai Cheng Chua, Cupertino, CA (US);
Masahiro Kawasaki, San Jose, CA (US);
Jenn-Yue Wang, Santa Clara, CA (US);
John Sudijono, Singapore, SG;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods of depositing a nanocrystalline diamond film are described. The method may be used in the manufacture of integrated circuits. Methods include treating a substrate with a plasma to form a treated substrate surface, incubating the treated substrate with a carbon-rich plasma to nucleate diamond particles on the treated substrate surface, followed by treating the substrate with a plasma to form a nanocrystalline diamond film. The resulting nanocrystalline diamond films are formed on an interfacial oxide-rich amorphous layer between the nanocrystalline diamond film and a silicon substrate.