Fremont, CA, United States of America

Jenn-Yue Wang

USPTO Granted Patents = 6 

Average Co-Inventor Count = 6.3

ph-index = 2

Forward Citations = 303(Granted Patents)


Company Filing History:


Years Active: 2012-2025

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):

Title: The Innovative Contributions of Jenn-Yue Wang

Introduction

Jenn-Yue Wang is a prominent inventor based in Fremont, California, known for his significant contributions to the field of materials science and engineering. With a total of six patents to his name, Wang has made remarkable advancements in the development of nanocrystalline diamond films and etching methods for integrated circuits. His work has implications for various applications in the semiconductor industry.

Latest Patents

Wang's latest patents include innovative methods for depositing nanocrystalline diamond films. One of his notable inventions describes a process that involves treating a substrate with plasma to create a treated surface, followed by incubating it with a carbon-rich plasma to nucleate diamond particles. This method results in the formation of nanocrystalline diamond films on an oxide-rich amorphous layer, which is crucial for the manufacturing of integrated circuits. Another significant patent focuses on low-temperature selective etching of silicon nitride using microwave plasma. This method allows for the etching of a 3D structure with a high selectivity ratio of silicon nitride to silicon oxide, enhancing the precision of semiconductor fabrication.

Career Highlights

Wang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in advancing technologies that are essential for modern electronics. His innovative approaches have not only contributed to the company's success but have also pushed the boundaries of what is possible in materials engineering.

Collaborations

Wang has collaborated with several talented individuals in his field, including Hua Chung and Abhishek Dube. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jenn-Yue Wang's contributions to the field of materials science and engineering are noteworthy and impactful. His innovative patents and work at Applied Materials, Inc. demonstrate his commitment to advancing technology in the semiconductor industry. Wang's achievements continue to inspire future innovations in the field.

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