The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Dec. 27, 2021
Methods of forming conformal transition metal dichalcogenide films for memory and logic applications
Applied Materials, Inc., Santa Clara, CA (US);
Chandan Das, Singapore, SG;
Susmit Singha Roy, Campbell, CA (US);
Bhaskar Jyoti Bhuyan, San Jose, CA (US);
Supriya Ghosh, San Jose, CA (US);
Jiecong Tang, Singapore, SG;
John Sudijono, Singapore, SG;
Abhijit Basu Mallick, Palo Alto, CA (US);
Mark Saly, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Transition metal dichalcogenide films and methods for depositing transition metal dichalcogenide films on a substrate are described. Methods for converting transition metal oxide films to transition metal dichalcogenide films are also described. The substrate is exposed to a metal precursor and an oxidant to form a transition metal oxide film; the transition metal oxide film is exposed to a chalcogenide precursor to form the transition metal dichalcogenide film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile