San Jose, CA, United States of America

Supriya Ghosh

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Supriya Ghosh: Innovator in Semiconductor Processing

Introduction

Supriya Ghosh is a prominent inventor based in San Jose, California. She has made significant contributions to the field of semiconductor processing, showcasing her expertise and innovative spirit. Her work has led to advancements that are crucial for the development of modern technology.

Latest Patents

Supriya Ghosh holds a patent for "Large area gapfill using volumetric expansion." This patent describes exemplary methods of semiconductor processing that include providing a silicon-containing precursor to a processing region of a semiconductor processing chamber. A substrate is disposed within this processing region, which defines one or more features along its surface. The methods involve depositing a silicon-containing material on the substrate, which extends into the features. Additionally, an oxygen-containing precursor is provided, and the silicon-containing material is annealed with this precursor. The annealing process causes the silicon-containing material to expand within the features, and the operations can be repeated to iteratively fill the features on the substrate. This innovative approach enhances the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Supriya Ghosh is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her role at the company allows her to apply her knowledge and skills in developing cutting-edge technologies that drive the industry forward. With her patent and contributions, she has established herself as a key player in the field.

Collaborations

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Conclusion

Supriya Ghosh's work in semiconductor processing exemplifies the impact of innovation in technology. Her patent and career at Applied Materials, Inc. highlight her contributions to the industry. She continues to inspire future generations of inventors and engineers.

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