The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2026

Filed:

Dec. 05, 2022
Applicants:

Applied Materials, Inc., Santa Clara, CA (US);

National University of Singapore, Singapore, SG;

Inventors:

Sze Chieh Tan, Singapore, SG;

Vicknesh Sahmuganathan, Singapore, SG;

Eswaranand Venkatasubramanian, Santa Clara, CA (US);

Abhijit Basu Mallick, Sunnyvale, CA (US);

John Sudijono, Singapore, SG;

Jiteng Gu, Singapore, SG;

Kian Ping Loh, Singapore, SG;

Assignees:

Applied Materials, Inc., Santa Clara, CA (US);

National University of Singapore, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/27 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/274 (2013.01); C23C 16/279 (2013.01); H01J 37/32192 (2013.01); H01J 2237/3321 (2013.01);
Abstract

Methods of depositing an adamantane film are described, which may be used in the manufacture of integrated circuits. Methods include processing a substrate in which an adamantane seed layer is deposited on a substrate, converting to a diamond nuclei layer having an increased crystallinity relative to the adamantane seed layer and then grown into full nanocrystalline diamond film from the diamond nuclei layer.


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