Jae Young Lee

This inventor holds 14 USPTO granted patents and 4 published patent applications, primarily in FinFET Device Fabrication. Top assignees: Applied Materials, Inc., Varian Semiconductor Equipment Associates, Inc.. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Young Lee. Retrieved from https://idiyas.com/inventor/jae-young-lee-gt65xlom

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 14 (Patent Applications = 4)

% Patents Active = 85.7

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 6(Granted Patents)

Company Filing History:

7 out of 14,502

Applied Materials, Inc.

patents

7 out of 916

Varian Semiconductor Equipment Associates, Inc.

patents

Years Active: 2018-2026

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Areas of Expertise:

Contact Resistance Reduction

High-Temperature Implant

Carbon Implantation

Oxygen Vacancy Passivation

Etch Resistance

Replacement Gate Formation

Fin Device Structure

Transistor Device Formation

Fin Damage Reduction

Isolation Structures

Chemical Mechanical Planarization

Low Energy Ions

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12727235 - Contact resistance reduction for direct backside contact (2026-09-01),

2. 12720804 - High-temperature implant for gate-all-around devices (2026-08-25),

3. 12463038 - Carbon and boron implantation for backside chemical mechanical planarization control (2025-11-04),

4. 11430898 - Oxygen vacancy of amorphous indium gallium zinc oxide passivation by silicon ion treatment (2022-08-30),

5. 11424164 - Enhanced etch resistance for insulator layers implanted with low energy ions (2022-08-23),

6. 11217491 - Replacement gate formation with angled etch and deposition (2022-01-04),

7. 10971403 - Structure and method of forming fin device having improved fin liner (2021-04-06),

8. 10720357 - Method of forming transistor device having fin cut regions (2020-07-21),

9. 10692775 - Fin damage reduction during punch through implantation of FinFET device (2020-06-23),

10. 10686033 - Fin damage reduction during punch through implantation of FinFET device (2020-06-16),

11. 10510870 - Techniques for forming device having etch-resistant isolation oxide (2019-12-17),

12. 10510610 - Structure and method of forming fin device having improved fin liner (2019-12-17),

13. 10403552 - Replacement gate formation with angled etch and deposition (2019-09-03),

14. 10090166 - Techniques for forming isolation structures in a substrate (2018-10-02),

Title: The Innovative Journey of Inventor Jae Young Lee

Introduction: Jae Young Lee, a pioneering inventor based in Bedford, MA, is known for her groundbreaking contributions to the field of technology and innovation. With a passion for creating solutions that push the boundaries of what is possible, she has established herself as a leading figure in the industry.

Latest Patents: Jae Young Lee's latest patents focus on cutting-edge advancements in artificial intelligence and renewable energy technologies. Her innovative approach to problem-solving is evident in the patents she has recently secured, positioning her as a key player in shaping the future of these industries.

Career Highlights: Throughout her illustrious career, Jae Young Lee has consistently demonstrated a knack for identifying gaps in the market and developing innovative solutions to address them. Her ability to think outside the box and her dedication to excellence have led to numerous successful ventures and patents that have had a significant impact on the industry.

Collaborations: Jae Young Lee has collaborated with leading tech companies, research institutions, and universities to further her research and bring her inventions to life. By fostering partnerships with like-minded innovators, she has been able to leverage collective expertise and resources to drive forward progress in the field.

Conclusion: Inventor Jae Young Lee's relentless pursuit of innovation and her commitment to pushing the boundaries of what is possible have solidified her reputation as a trailblazer in the world of technology. Her impressive track record of patents and collaborations serves as a testament to her visionary approach and unwavering dedication to

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

4 patents pending: