The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Aug. 28, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Andrew Michael Waite, Beverly, MA (US);

Johannes M. van Meer, Middleton, MA (US);

Jae Young Lee, Bedford, MA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01); H01L 21/26 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823418 (2013.01); H01L 21/26 (2013.01); H01L 21/823431 (2013.01);
Abstract

In one embodiment, a method may include providing a substrate, comprising a plurality of surface features, an isolation layer, disposed between the plurality of surface features, and a substrate base, disposed subjacent the isolation layer and the plurality of surface features, wherein the plurality of surface features extend above a surface of the isolation layer. The method may include directing a low energy ion beam to the substrate, when the substrate is heated at a targeted temperature, wherein an altered layer is formed within an outer portion of the isolation layer, and wherein an inner portion of the isolation layer is not implanted.


Find Patent Forward Citations

Loading…