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For the Inventor, By the Inventor

Aalen, Germany

Hartmut Enkisch

This inventor holds 27 USPTO granted patents and 8 published patent applications and 7 EPO patents, primarily in EUV Lithography. Top assignees: Carl Zeiss Smt Gmbh, Carl-Zeiss-Smt Ag. Active years: 2007-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hartmut Enkisch. Retrieved from https://idiyas.com/inventor/hartmut-enkisch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27 

% Patents Active = 59.3

 

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 34(Granted Patents)


Company Filing History:

goldMedal23 out of 1,482 
 
Carl Zeiss Smt Gmbh
 patents
silverMedal4 out of 461 
 
Carl-Zeiss-Smt Ag
 patents

Years Active: 2007-2026

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Areas of Expertise:
EUV Lithography
Optical System
Reflective Optical Element
Microlithography
Projection Exposure Apparatus
Illumination System
Mirror Element
Lens Crystalline Material
Intensity Adaptation Filter
Multilayer Coating
Imaging Optical System
Projection Objective
27 patents (USPTO):Explore Patents
1. 12754483 - Mirror, optical system and method for operating an optical system (2026-10-06),
2. 12406777 - Optical element for a EUV projection exposure system (2025-09-02),
3. 11073765 - Method for producing a reflective optical element and reflective optical element (2021-07-27),
4. 10916356 - Reflective optical element (2021-02-09),
5. 10809625 - Intensity adaptation filter for EUV microlithography, method for producing same, and illumination system having a corresponding filter (2020-10-20),
6. 10598921 - Mirror element, in particular for a microlithographic projection exposure apparatus (2020-03-24),
7. 10545323 - Projection optical unit for EUV projection lithography (2020-01-28),
8. 10520827 - Optical system, in particular for a microlithographic projection exposure apparatus (2019-12-31),
9. 10423073 - Method for producing a mirror element (2019-09-24),
10. 10331048 - Mirror, in particular for a microlithographic projection exposure apparatus (2019-06-25),
11. 10146136 - Reflecting coating with optimized thickness (2018-12-04),
12. 10061204 - Mirror, in particular for a microlithographic projection exposure apparatus (2018-08-28),
13. 9915873 - Reflective optical element, and optical system of a microlithographic projection exposure apparatus (2018-03-13),
14. 9778576 - Microlithography illumination system and microlithography illumination optical unit (2017-10-03),
15. 9720329 - Projection objective of a microlithographic projection exposure apparatus (2017-08-01),

Title: Hartmut Enkisch - Innovative Inventor from Aalen

Introduction: Hartmut Enkisch is a renowned inventor hailing from Aalen, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Hartmut Enkisch holds several patents in the areas of renewable energy, sustainable materials, and advanced manufacturing processes, showcasing his commitment to innovation.

Career Highlights: Throughout his career, Hartmut Enkisch has worked tirelessly to develop cutting-edge solutions that have revolutionized industries, earning him a reputation as a visionary inventor.

Collaborations: Hartmut Enkisch has collaborated with leading research institutions and companies worldwide, fostering a culture of innovation and driving progress in the field of technology.

Conclusion: Hartmut Enkisch's passion for innovation and his dedication to pushing the boundaries of what is possible make him a true pioneer in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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