The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Dec. 17, 2018
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 17/06 (2006.01); G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
G02B 17/0663 (2013.01); G02B 5/0891 (2013.01); G03F 7/702 (2013.01); G03F 7/70233 (2013.01); G03F 7/70958 (2013.01);
Abstract
A projection optical unit for EUV projection lithography has a plurality of mirrors for imaging an object field into an image field with illumination light. At least one of the mirrors is an NI mirror and at least one of the mirrors is a GI mirror. A mirror dimension Dx of the at least one NI mirror in a plane of extent (xz) perpendicular to a plane of incidence (yz) satisfies the following relationship:4 A mirror dimension Dy of the at least one GI mirror in the plane of incidence (yz) satisfies the following relationship:4/(cos())<