The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2021
Filed:
Aug. 02, 2018
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Hartmut Enkisch, Aalen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
For increasing reflectivity a reflective optical element for the extreme ultraviolet wavelength range consists of at least two upper units, in which each upper unit (B-B) has a plurality of lower units, for example reflective optical elements in the form of mirror arrays. A method for producing the reflective optical element includes: determination of incidence angles and incidence angle bandwidths occurring during operation above the surface of each upper unit (B-B); and application of a reflective coating to each upper unit (B-B), adapted to the incidence angles and incidence angle bandwidths respectively determined above the surface of each upper unit. This is particularly suitable for producing reflective optical elements embodied as field facet mirrors, particularly in the form of microelectromechanical mirror arrays, for an EUV lithography device.