The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2018
Filed:
Aug. 28, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
An illumination system for an optical arrangement such as an EUV lithography apparatus, having: at least one optical element which has at least one optical surface, on which a coating which reflects illumination radiation is applied, and an actuator device aligning the optical surface in at least two angular positions in the radiation path. The coating either has a thickness (d) at which a mean value (½(R+R)) formed from a thickness-dependent reflectivity (R, R) of the coating at the at least two angular positions is maximized or has a thickness (d) at which a maximum change (max(ΔR/R, ΔR/R)) in the reflectivity (R, R) caused by a thickness tolerance of the coating is minimized at the respective angular positions or else the reflecting coating has a thickness (d) at which the reflectivity (R, R) of the coating has the same magnitude in the at least two angular positions.