The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Dec. 11, 2017
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G02B 26/08 (2006.01); G02B 7/18 (2006.01); G02B 5/08 (2006.01); G03F 7/20 (2006.01); G02B 5/09 (2006.01); G02B 5/10 (2006.01);
U.S. Cl.
CPC ...
G02B 26/0833 (2013.01); G02B 5/0816 (2013.01); G02B 5/0891 (2013.01); G02B 5/09 (2013.01); G02B 5/10 (2013.01); G02B 7/181 (2013.01); G03F 7/7015 (2013.01); G03F 7/70075 (2013.01); G03F 7/70116 (2013.01); G03F 7/70316 (2013.01); G03F 7/70891 (2013.01); G03F 7/70958 (2013.01);
Abstract
A mirror element, in particular for a microlithographic projection exposure apparatus. According to one aspect, the mirror element includes a substrate (-) and a layer stack (-) on the substrate. The layer stack has at least one reflection layer system, wherein a curvature of the mirror element is generated on the basis of a setpoint curvature for a predetermined operating temperature by a non-vanishing bending force exerted by the layer stack, wherein the generated curvature varies by no more than 10% over a temperature interval (ΔT) of at least 10 K.