Ulm, Germany

Christoph Nottbohm

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 2.6

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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4 patents (USPTO):

Title: Innovator Christoph Nottbohm: Pioneering EUV Lithography Solutions

Introduction

Christoph Nottbohm is an esteemed inventor based in Ulm, Germany, recognized for his contributions to the field of extreme ultraviolet (EUV) lithography. With a total of three patents to his name, Nottbohm is known for developing innovative methods that enhance the performance and reliability of reflective optical elements used in advanced lithography systems.

Latest Patents

One of Nottbohm’s notable inventions is a method for repairing reflective optical elements for EUV lithography. This cost-effective method addresses the issue of damage caused by the formation of hydrogen bubbles on the optical elements. The process involves localizing the damaged area and covering it with materials that exhibit low hydrogen permeability through the application of a cover element. This method is particularly beneficial for collector mirrors used in EUV lithography, ensuring their longevity and efficiency.

Another significant patent features a reflective optical element designed for the extreme ultraviolet wavelength range, which includes a multi-layer system on a substrate. This innovative design consists of layers made from at least two different materials, arranged alternately to optimize performance. The configuration allows for a stack where the materials’ refractive indices differ, enhancing the optical properties of the reflective element.

Career Highlights

Christoph Nottbohm works with Carl Zeiss SMT GmbH, a company known for its expertise in optical technology and lithography systems. His work at Zeiss has been pivotal in advancing the state of EUV technologies, making significant strides in the efficiency of lithographic processes utilized in semiconductor manufacturing.

Collaborations

Throughout his career, Nottbohm has collaborated with talented colleagues, including Robert Meier and Holger Kierey. These partnerships have fostered an environment of innovation and creativity, contributing to the successful development of cutting-edge solutions in the field of optics and lithography.

Conclusion

With his groundbreaking inventions and contributions to EUV lithography, Christoph Nottbohm continues to influence the realm of optical technologies. His commitment to enhancing the performance of reflective optical elements ensures that groundbreaking advancements in lithography will persist, propelling the semiconductor industry into the future.

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