The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Dec. 22, 2022
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Hartmut Enkisch, Aalen, DE;
Sandro Hoffmann, Giengen, DE;
Joern Weber, Aalen, DE;
Sebastian Strobel, Aalen, DE;
Mirko Ribow, Oberkochen, DE;
Christoph Nottbohm, Ulm, DE;
Matthias Sturm, Waiblingen, DE;
Michael Krause, Ulm, DE;
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/06 (2006.01); G02B 1/12 (2006.01); G02B 5/08 (2006.01); G02B 5/18 (2006.01); G02B 5/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G21K 1/062 (2013.01); G02B 1/12 (2013.01); G02B 5/208 (2013.01); G03F 7/70175 (2013.01); G02B 5/0891 (2013.01); G02B 5/1857 (2013.01); G02B 2207/107 (2013.01); G21K 2201/064 (2013.01);
Abstract
In a method for producing an optical element for an EUV projection exposure apparatus, a shaping layer () is applied onto a substrate () so as to have a surface roughness of at most 0.5 nm rms directly after the application of the shaping layer onto the substrate.