Waiblingen, Germany

Matthias Sturm

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Matthias Sturm

Introduction

Matthias Sturm is a notable inventor based in Waiblingen, Germany. He has made significant contributions to the field of optical engineering, particularly in the development of advanced optical elements for projection exposure systems.

Latest Patents

One of his key patents is titled "Optical element for a EUV projection exposure system." This innovative patent describes a method for producing an optical element for an EUV projection exposure apparatus. In this method, a shaping layer is applied onto a substrate to achieve a surface roughness of at most 0.5 nm rms directly after the application of the shaping layer onto the substrate. This advancement is crucial for enhancing the performance of EUV lithography systems.

Career Highlights

Matthias Sturm is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and technologies. His work at this prestigious organization has allowed him to push the boundaries of optical design and engineering.

Collaborations

Throughout his career, Matthias has collaborated with talented individuals such as Hartmut Enkisch and Sandro Hoffmann. These collaborations have fostered an environment of innovation and creativity, leading to groundbreaking advancements in optical technology.

Conclusion

Matthias Sturm's contributions to the field of optical engineering, particularly through his patent for an EUV projection exposure system, highlight his role as a significant inventor. His work continues to influence the development of advanced optical technologies.

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