Company Filing History:
Years Active: 2018-2025
Title: The Innovations of Sebastian Strobel
Introduction
Sebastian Strobel is a prominent inventor based in Aalen, Germany. He has made significant contributions to the field of optical engineering, particularly in the development of technologies for extreme ultraviolet (EUV) lithography. With a total of 5 patents to his name, Strobel's work has been instrumental in advancing the capabilities of EUV projection exposure systems.
Latest Patents
Strobel's latest patents include an innovative optical element designed for EUV projection exposure systems. This method involves applying a shaping layer onto a substrate, achieving a surface roughness of at most 0.5 nm rms immediately after application. Another notable patent focuses on treating reflective optical elements for the EUV wavelength range. This method entails irradiating a reflective optical element with radiation pulses while ensuring relative movement between the radiation source and the optical element. These reflective optical elements are particularly suitable for EUV lithography and inspection of masks or wafers.
Career Highlights
Sebastian Strobel is currently employed at Carl Zeiss SMT GmbH, a leading company in optical systems and technologies. His work at Zeiss has allowed him to push the boundaries of optical engineering and contribute to cutting-edge advancements in the field.
Collaborations
Throughout his career, Strobel has collaborated with notable colleagues, including Hartmut Enkisch and Oliver Dier. These partnerships have fostered a collaborative environment that enhances innovation and drives the development of new technologies.
Conclusion
Sebastian Strobel's contributions to optical engineering and EUV technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the field. As he continues to work at Carl Zeiss SMT GmbH, his impact on the industry is expected to grow even further.