The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Jul. 31, 2018
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Christian Grasse, Garching, DE;
Martin Hermann, Heidenheim, DE;
Stephan Six, Augsburg, DE;
Joern Weber, Aalen, DE;
Ralf Winter, Schwaebisch Gmuend, DE;
Oliver Dier, Lauchheim, DE;
Vitaliy Shklover, Heidenheim, DE;
Kerstin Hild, Schwaebisch Gmuend, DE;
Sebastian Strobel, Aalen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
Treating a reflective optical element () for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder () is irradiated with at least one radiation pulse of a radiation source () having a duration of between 1 μs and 1 s. At least one radiation source () and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.