The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2018
Filed:
May. 20, 2016
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Hartmut Enkisch, Aalen, DE;
Hans-Jochen Paul, Aalen, DE;
Thomas Schicketanz, Aalen, DE;
Oliver Dier, Lauchheim, DE;
Joern Weber, Aalen, DE;
Christian Grasse, Garching, DE;
Ralf Winter, Schwaebisch Gmuend, DE;
Sebastian Strobel, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A reflective optical element () having a substrate () and a multilayer system () that has a plurality of partial stacks (), each with a first layer () of a first material and a second layer () of a second material. The first material and the second material differ from one another in refractive index at an operating wavelength of the optical element. Each of the partial stacks has a thickness (D) and a layer thickness ratio (Γ), wherein the layer thickness ratio is the quotient of the thickness of the respective first layer and the partial stack thickness (D). In a first section of the multilayer system, for at least one of the two variables of partial stack thickness (D) and layer thickness ratio (Γ), the mean square deviation from the respective mean values therefor is at least 10% less than in a second section of the multilayer system.