The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Sep. 13, 2016
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Hartmut Enkisch, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface, wherein the mirror has a reflectivity of at least 0.5 for electromagnetic radiation which has a prescribed working wavelength and impinges on the optically effective surface at an angle of incidence based on the respective surface normal of at least 65°, wherein the mirror has at least one layer () which comprises a compound of an element of the second period and an element of the 4d transition group, wherein the mirror has a protective layer () arranged on top in the direction of the optically effective surface, wherein the material of the layer () arranged in each case underneath the protective layer in the direction of the optically effective surface has a lower absorption than the material of the protective layer ().