The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2019
Filed:
Jan. 07, 2019
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Hartmut Enkisch, Aalen, DE;
Thomas Schicketanz, Aalen, DE;
Matus Kalisky, Aalen, DE;
Oliver Dier, Lauchheim, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
An optical system, in particular for a microlithographic projection exposure apparatus, with at least one mirror () which has an optically effective surface and, for electromagnetic radiation of a predefined operating wavelength impinging on the optically effective surface at an angle of incidence of at least 65° relative to the respective surface normal, has a reflectivity of at least 0.5. The mirror has a reflection layer () and a compensation layer () which is arranged above this reflection layer () in the direction of the optically effective surface. The compensation layer (), for an intensity distribution generated in a pupil plane or a field plane of the optical system during operation thereof, reduces the difference between the maximum and the minimum intensity value by at least 20% compared to an analogous structure without the compensation layer.