The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
Jan. 15, 2018
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Oliver Dier, Lauchheim, DE;
Kerstin Hild, Schwaebisch Gmuend, DE;
Hartmut Enkisch, Aalen, DE;
Matus Kalisky, Aalen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A mirror, in particular for a microlithographic projection exposure apparatus, has an optically effective surface, a mirror substrate (), a reflection layer (), which is configured to provide the mirror with a reflectivity of at least 50% for electromagnetic radiation with a predetermined operating wavelength incident on the optically effective surface () at angles of incidence in relation to the respective surface normals of at least 65°, and a substrate protection layer () which is arranged between the mirror substrate () and the reflection layer (). The substrate protection layer has a transmission of less than 0.1% for EUV radiation.