Fusen E Chen

Title: Innovations in Semiconductor Technology: The Contributions of Fusen E Chen

Introduction: Fusen E Chen is a prominent inventor based in Cupertino, California, known for his extensive contributions to the field of semiconductor technology. With a remarkable portfolio of 59 patents, he has made significant advancements in the processes and methods related to sputtering and ion deposition.

Latest Patents: Chen's latest patents showcase his cutting-edge work in the area of plasma technology for sputtering applications. One notable patent is focused on a "Self-ionized and inductively-coupled plasma for sputtering and resputtering." This patent describes a magnetron sputter reactor capable of depositing materials like tantalum, tantalum nitride, and copper through either self-ionized plasma (SIP) sputtering or inductively coupled plasma (ICP) sputtering. His invention promotes the simultaneous or alternate use of these methods in different chambers, enhancing efficiency and material characteristics during the deposition process. The use of auxiliary magnets, paired with a specially designed magnetron, allows for better control of the magnetic fields involved in the sputtering process.

Another significant patent involves a method for depositing a diffusion barrier layer and a metal conductive layer on semiconductor feature surfaces. This innovative technique utilizes ion deposition sputtering to apply a sculptured layer of material while protecting the substrate from erosion and contamination. By depositing a protective layer before applying a sculptured layer, Chen ensures the integrity and functionality of the semiconductor features.

Career Highlights: Fusen E Chen has an illustrious career, having worked at Applied Materials, Inc., a leader in semiconductor equipment manufacturing. His innovations have often been referenced and implemented within industry practices, solidifying his reputation as an influential figure in semiconductor technology.

Collaborations: Throughout his career, Chen has collaborated with notable peers, including Zheng Xu and Jianming Fu. Their collective expertise has contributed to breakthroughs in material science and semiconductor processing, enhancing the performance and reliability of electronic components.

Conclusion: Fusen E Chen's work exemplifies the importance of innovation in the rapidly evolving field of semiconductor technology. His extensive patent portfolio reflects his commitment to developing advanced methods that enhance semiconductor manufacturing practices. Through his contributions, he continues to shape the future of technology, influencing both industry standards and academic research.