Peijun Ding

This inventor holds 92 USPTO granted patents and 6 published patent applications and 1 EPO patent, primarily in Thin Film Deposition (CPC class C23C1-434). Top assignees: Applied Materials, Inc., Silevo, Inc., The State University of New York. Active years: 1997-2018.

USPTO Granted Patents = 92 (Patent Applications = 6)

% Patents Active = 78.3

EPO Patents = 1 (Patent Applications = 2)

Average Co-Inventor Count = 4.2

ph-index = 27

Forward Citations = 1,872(Granted Patents)

Forward Citations (Not Self Cited) = 1,764(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Albany, NY (US) (1997 - 1999)
San Jose, CA (US) (1998 - 2018)
Saratoga, CA (US) (2005 - 2018)

Company Filing History:

82 out of 14,418

Applied Materials, Inc.

The State University of New York

patents

4. 1 out of 23

Applied Material, Inc.

patents

5. 1 out of 226

Solarcity Corporation

patents

Years Active: 1997-2018

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Areas of Expertise:

Thin Film Deposition

Sputtering Techniques

Silicon Deposition

Epitaxial Reactor

Metal Seed Layer

Diffusion Barrier Layer

Copper Interconnect

Inductively Coupled Plasma

Magnetron Sputtering

Solar Cells

Multi-Component Doping

Thermally Resistive Materials

92 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10047430 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2018-08-14),

2. 9991157 - Method for depositing a diffusion barrier layer and a metal conductive layer (2018-06-05),

3. 9537032 - Low-cost high-efficiency solar module using epitaxial Si thin-film absorber and double-sided heterojunction solar cell with integrated module fabrication (2017-01-03),

4. 9390970 - Method for depositing a diffusion barrier layer and a metal conductive layer (2016-07-12),

5. 8968473 - Stackable multi-port gas nozzles (2015-03-03),

6. 8845809 - Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition (2014-09-30),

7. 8696875 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2014-04-15),

8. 8668816 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2014-03-11),

9. 8652259 - Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition (2014-02-18),

10. 8637761 - Solar cells fabricated by using CVD epitaxial Si films on metallurgical-grade Si wafers (2014-01-28),

11. 8500963 - Sputtering of thermally resistive materials including metal chalcogenides (2013-08-06),

12. 8460519 - Protective offset sputtering (2013-06-11),

13. 8454804 - Protective offset sputtering (2013-06-04),

14. 8158511 - Method of depositing a uniform barrier layer and metal seed layer with reduced overhang over a plurality of recessed semiconductor features (2012-04-17),

15. 7989343 - Method of depositing a uniform metal seed layer over a plurality of recessed semiconductor features (2011-08-02),

Title: The Innovative Journey of Peijun Ding

Introduction: Peijun Ding, a talented inventor based in Saratoga, CA, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Peijun Ding holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a background in computer science and engineering, Peijun Ding has a successful career marked by his ability to translate complex ideas into practical solutions. He has worked for leading tech companies, driving innovation and pushing the boundaries of what is possible.

Collaborations: Throughout his career, Peijun Ding has collaborated with top researchers, engineers, and developers to bring his ideas to life. His collaborative spirit and passion for innovation have led to the creation of groundbreaking technologies that have shaped the industry.

Conclusion: Peijun Ding's relentless pursuit of innovation and his dedication to pushing the boundaries of technology make him a standout inventor in the field. His work continues to inspire and drive progress in the ever-evolving tech landscape.