The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Nov. 01, 2005
Fusen Chen, Saratoga, CA (US);
Ling Chen, Sunnyvale, CA (US);
Walter Benjamin Glenn, Pacifica, CA (US);
Praburam Gopalraja, San Jose, CA (US);
Jianming Fu, Palo Alto, CA (US);
Fusen Chen, Saratoga, CA (US);
Ling Chen, Sunnyvale, CA (US);
Walter Benjamin Glenn, Pacifica, CA (US);
Praburam Gopalraja, San Jose, CA (US);
Jianming Fu, Palo Alto, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In a first aspect, a method is provided that includes () forming a first barrier layer over the sidewalls and bottom of a via using atomic layer deposition within an atomic layer deposition (ALD) chamber; () removing at least a portion of the first barrier layer from the bottom of the via by sputter etching; and () depositing a second barrier layer on the sidewalls and bottom of the via within the ALD chamber. Numerous other embodiments are provided, as are systems, methods and computer program products in accordance with these and other aspects.