Walter Benjamin Glenn

Title: Inventor Spotlight: Walter Benjamin Glenn

Introduction:

Walter Benjamin Glenn, a prolific inventor based in Pacifica, CA (US), has made significant contributions to the field of semiconductor manufacturing with a total of 10 patents to his name. His innovative work showcases a deep understanding of thin film deposition processes and multi-station deposition apparatus.

Latest Patents:

1. Apparatus for Cyclical Depositing of Thin Films: Glenn's patent presents an apparatus designed for the cyclical depositing of thin films on semiconductor substrates. It features a process chamber with a sophisticated gas distribution system and an exhaust system synchronized with the operation of valves for precise dosing of process gases.

2. Multi-Station Deposition Apparatus and Method: Another patent by Glenn introduces a multi-station deposition apparatus capable of processing multiple substrates simultaneously using different stations. This apparatus incorporates a gas curtain to separate stations and a multi-station platen that supports and rotates wafers for efficient deposition.

Career Highlights:

Currently affiliated with Applied Materials, Inc., Walter Benjamin Glenn has carved a niche for himself in the semiconductor industry. His expertise in developing cutting-edge deposition technologies has helped advance the production processes in semiconductor manufacturing.

Collaborations:

Glenn has had the privilege of working alongside talented individuals in his field. Some of his noteworthy coworkers include Lawrence C Lei and Mei Yin Chang, who have also played instrumental roles in driving innovation and excellence in semiconductor technologies.

Conclusion:

In conclusion, Walter Benjamin Glenn's inventive spirit and dedication to enhancing semiconductor manufacturing have resulted in groundbreaking patents that have shaped the industry. His collaborative efforts and innovative approaches make him a key figure in the realm of thin film deposition technologies.