The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Oct. 30, 2008
Randhir P. S. Thakur, San Jose, CA (US);
Alfred W. Mak, Union City, CA (US);
Ming Xi, Palo Alto, CA (US);
Walter Benjamin Glenn, Pacifica, CA (US);
Ahmad A. Khan, Milpitas, CA (US);
Ayad A. Al-shaikh, Santa Clara, CA (US);
Avgerinos V. Gelatos, Redwood City, CA (US);
Salvador P. Umotoy, Antioch, CA (US);
Randhir P. S. Thakur, San Jose, CA (US);
Alfred W. Mak, Union City, CA (US);
Ming Xi, Palo Alto, CA (US);
Walter Benjamin Glenn, Pacifica, CA (US);
Ahmad A. Khan, Milpitas, CA (US);
Ayad A. Al-Shaikh, Santa Clara, CA (US);
Avgerinos V. Gelatos, Redwood City, CA (US);
Salvador P. Umotoy, Antioch, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.