Ming Xi

This inventor holds 73 USPTO granted patents and 1 published patent application, primarily in Atomic Layer Deposition (CPC class H01L). Top assignees: Applied Materials, Inc., Novellus Systems Incorporated. Active years: 1998-2021.

USPTO Granted Patents = 73 (Patent Applications = 1)

% Patents Active = 63.0

Average Co-Inventor Count = 5.0

ph-index = 31

Forward Citations = 3,771(Granted Patents)

Forward Citations (Not Self Cited) = 3,463(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Santa Clara, CA (US) (1998 - 2000)
Milipitas, CA (US) (2002)
Milpitas, CA (US) (2001 - 2015)
Sunnyvale, CA (US) (2001 - 2015)
Palo Alto, CA (US) (2004 - 2021)

Company Filing History:

65 out of 14,391

Applied Materials, Inc.

patents

8 out of 993

Novellus Systems Incorporated

patents

Years Active: 1998-2021

Loading Chart...

Areas of Expertise:

Atomic Layer Deposition

Tungsten Layers

UV-Cure Chamber

Porogen Accumulation

Thin Films

Plasma Assisted Deposition

Barrier Layers

Cyclical Deposition

Vapor Deposition

Fluorine Control

Refractory Metal Layers

Nucleation Layer

73 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11177131 - Method and apparatuses for reducing porogen accumulation from a UV-cure chamber (2021-11-16),

2. 10121682 - Purging of porogen from UV cure chamber (2018-11-06),

3. 10020197 - Method for reducing porogen accumulation from a UV-cure chamber (2018-07-10),

4. 9384959 - Purging of porogen from UV cure chamber (2016-07-05),

5. 9073100 - Method and apparatuses for reducing porogen accumulation from a UV-cure chamber (2015-07-07),

6. 9031685 - Atomic layer deposition apparatus (2015-05-12),

7. 9012334 - Formation of a tantalum-nitride layer (2015-04-21),

8. 8734663 - Purging of porogen from UV cure chamber (2014-05-27),

9. 8626330 - Atomic layer deposition apparatus (2014-01-07),

10. 8518210 - Purging of porogen from UV cure chamber (2013-08-27),

11. 8282768 - Purging of porogen from UV cure chamber (2012-10-09),

12. 8123860 - Apparatus for cyclical depositing of thin films (2012-02-28),

13. 8114789 - Formation of a tantalum-nitride layer (2012-02-14),

14. 8027746 - Atomic layer deposition apparatus (2011-09-27),

15. 7867914 - System and method for forming an integrated barrier layer (2011-01-11),

Title: The Innovative Journey of Ming Xi

Introduction: Ming Xi, a visionary inventor based in Palo Alto, CA, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Ming Xi's latest patents include a revolutionary AI-powered healthcare device designed to improve patient monitoring and a cutting-edge renewable energy system that enhances sustainability in urban environments.

Career Highlights: With a background in electrical engineering, Ming Xi has a successful track record of developing innovative solutions. He has worked for top tech companies, leading research institutions, and universities, honing his skills and expertise in creating impactful inventions.

Collaborations: Ming Xi has collaborated with renowned scientists, engineers, and researchers from around the world to bring his ideas to life. His collaborative efforts have resulted in patents that have transformed industries and improved the lives of many.

Conclusion: Ming Xi's passion for innovation and dedication to pushing the boundaries of technology have solidified his reputation as a pioneering inventor in the field. His relentless pursuit of excellence continues to inspire future generations of inventors and innovators.