The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
May. 20, 2015
Novellus Systems, Inc., Fremont, CA (US);
Lisa Gytri, Sherwood, OR (US);
Jeff Gordon, West Linn, OR (US);
James Lee, Damascus, OR (US);
Carmen Balderrama, Wilsonville, OR (US);
Joseph Brett Harris, Tualatin, OR (US);
Eugene Smargiassi, Tualatin, OR (US);
Stephen Yu-Hong Lau, Lake Oswego, OR (US);
George D. Kamian, Scotts Valley, CA (US);
Ming Xi, Palo Alto, CA (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
Porogen accumulation in a UV-cure chamber is reduced by removing outgassed porogen through a heated outlet while purge gas is flowed across a window through which a wafer is exposed to UV light. A purge ring having specific major and minor exhaust to inlet area ratios may be partially made of flame polished quartz to improve flow dynamics. The reduction in porogen accumulation allows more wafers to be processed between chamber cleans, thus improving throughput and cost.