James Forest Lee

USPTO Granted Patents = 16 (Patent Applications = 2)

Average Co-Inventor Count = 3.3

ph-index = 6

Forward Citations = 92(Granted Patents)

Location History:

Damascus, OR (US) (2012 - 2024)
Casper, WY (US) (2024)

Company Filing History:

8 out of 993

Novellus Systems Incorporated

patents

8 out of 3,768

Lam Research Corporation

patents

Years Active: 2012-2025

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16 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12338531 - Spatially tunable deposition to compensate within wafer differential bow (2025-06-24),

2. 12013682 - Remote-plasma clean (RPC) directional-flow device (2024-06-18),

3. 11946142 - Spatially tunable deposition to compensate within wafer differential bow (2024-04-02),

4. 11619925 - Remote-plasma clean (RPC) directional-flow device (2023-04-04),

5. 11177131 - Method and apparatuses for reducing porogen accumulation from a UV-cure chamber (2021-11-16),

6. 10240236 - Clean resistant windows for ultraviolet thermal processing (2019-03-26),

7. 10161034 - Rapid chamber clean using concurrent in-situ and remote plasma sources (2018-12-25),

8. 10147597 - Turbulent flow spiral multi-zone precursor vaporizer (2018-12-04),

9. 10020197 - Method for reducing porogen accumulation from a UV-cure chamber (2018-07-10),

10. 9073100 - Method and apparatuses for reducing porogen accumulation from a UV-cure chamber (2015-07-07),

11. 9028765 - Exhaust flow spreading baffle-riser to optimize remote plasma window clean (2015-05-12),

12. 8883406 - Method for using a purge ring with split baffles in photonic thermal processing systems (2014-11-11),

13. 8801950 - Reduction of a process volume of a processing chamber using a nested dynamic inert volume (2014-08-12),

14. 8608035 - Purge ring with split baffles for photonic thermal processing systems (2013-12-17),

15. 8398816 - Method and apparatuses for reducing porogen accumulation from a UV-cure chamber (2013-03-19),

Title: James Forest Lee: Innovator in Semiconductor Processing Technologies

Introduction

James Forest Lee is a prominent inventor based in Damascus, OR (US), known for his significant contributions to the field of semiconductor processing. With a total of 16 patents to his name, Lee has developed innovative technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, Lee has developed a "Spatially tunable deposition to compensate within wafer differential bow." This invention involves a plasma processing chamber designed for depositing a film on the underside surface of a wafer. The chamber features a showerhead pedestal that includes a first zone for depositing a first film and a second zone for depositing a second film. Another notable patent is the "Remote-plasma clean (RPC) directional-flow device." This invention encompasses various apparatuses and methods for utilizing a remote-plasma cleaning system with a directional-flow device, allowing for the concurrent cleaning of multiple processing stations in a semiconductor processing tool.

Career Highlights

Throughout his career, James Forest Lee has worked with leading companies in the semiconductor industry, including Novellus Systems Incorporated and Lam Research Corporation. His work has significantly impacted the development of advanced semiconductor manufacturing technologies.

Collaborations

Lee has collaborated with notable professionals in the field, including Lisa Marie Gytri and Eugene Smargiassi. These collaborations have contributed to the advancement of innovative solutions in semiconductor processing.

Conclusion

James Forest Lee's contributions to semiconductor processing technologies through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor manufacturing.

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