The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Apr. 21, 2017
Lam Research Corporation, Fremont, CA (US);
Keith Fox, Tigard, OR (US);
Jonathan Church, Portland, OR (US);
James Lee, Damascus, OR (US);
Matthew Mudrow, Tigard, OR (US);
Kevin Gerber, Portland, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for cleaning a processing chamber of a substrate processing system includes supplying nitrogen trifluoride (NF) gas to a remote plasma source (RPS); generating RPS plasma using the RPS; supplying the RPS plasma to the processing chamber; supplying NFgas as bypass gas to the processing chamber; striking in-situ plasma in the processing chamber while the RPS plasma is supplied; and cleaning the processing chamber during a cleaning period using both the RPS plasma and the in-situ plasma.