The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Mar. 06, 2015
Lam Research Corporation, Fremont, CA (US);
James Lee, Damascus, OR (US);
George Andrew Antonelli, Portland, OR (US);
Kevin M. McLaughlin, Sherwood, OR (US);
Andrew John McKerrow, Lake Oswego, OR (US);
Curtis Bailey, West Linn, OR (US);
Alexander R. Fox, Portland, OR (US);
Stephen Lau, Lake Oswego, OR (US);
Eugene Smargiassi, Tualatin, OR (US);
Casey Holder, Tualatin, OR (US);
Troy Daniel Ribaudo, Portland, OR (US);
Xiaolan Chen, Tigard, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Apparatuses and methods for cleaning a semiconductor processing chamber is provided. The semiconductor processing chamber may include a UV radiation source, a substrate holder, and a UV transmissive window. The UV transmissive window may include one or multiple panes. One or more panes of the UV transmissive window may be non-reactive with fluorine containing chemistries. In multi-pane windows a purge gas flow path may be formed in the gap between windows. A purge gas may be flowed through the purge gas flow path to prevent process gases used in the chamber interior from reaching one or more panes of the UV transmissive window.