Alexander R Fox

Title: Spotlight on Inventor Alexander R Fox

Introduction:

Meet Alexander R Fox, a talented inventor based in Portland, Oregon. With a remarkable total of 6 patents to his name, his innovative work has greatly impacted the field of selective material deposition.

Latest Patents:

Two of his recent patents showcase his expertise in selective growth and deposition techniques. The first patent involves the selective growth of SiO2 on dielectric surfaces in the presence of copper, utilizing methods that allow for precise control over material deposition. The second patent focuses on geometrically selective deposition of a dielectric film, showcasing his ingenuity in enhancing material deposition processes.

Career Highlights:

Throughout his career, Alexander R Fox has made significant contributions while working at renowned companies such as Lam Research Corporation. His expertise and dedication have led to the development of groundbreaking technologies in the field of materials science and deposition processes.

Collaborations:

Alexander R Fox has had the privilege of collaborating with esteemed coworkers such as Dennis Michael Hausmann and David Charles Smith. Together, they have worked on innovative projects that have pushed the boundaries of material deposition technologies.

Conclusion:

Inventor Alexander R Fox's impressive portfolio of patents and collaborations highlights his passion for innovation and his commitment to advancing the field of material science. His pioneering work continues to inspire future generations of inventors and researchers in the realm of selective material deposition.