The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2013

Filed:

Apr. 20, 2011
Applicants:

James Lee, Damascus, OR (US);

Lisa Gytri, Tigard, OR (US);

Inventors:

James Lee, Damascus, OR (US);

Lisa Gytri, Tigard, OR (US);

Assignee:

Novellus Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 1/00 (2006.01); G03B 27/52 (2006.01); F27D 11/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A purge ring for a photonic temperature processing system includes a first layer, a second layer, and a third layer. The first layer, the second layer and the third layer define an inner region. The first layer and the second layer define a first plenum and a first baffle. The first plenum receives a first gas that flows through the first plenum and the first baffle to the inner region. The second layer and the third layer define a second plenum and a second baffle. The second plenum receives a second gas that flows through the second plenum and the second baffle to the inner region, and wherein the second baffle is one of less restrictive and more restrictive than the first baffle.


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