Jan Willem Maes

Wilrijk, Belgium

Jan Willem Maes

This inventor holds 107 USPTO granted patents and 27 published patent applications and 5 EPO patents, primarily in Thin Film Deposition (CPC class H01L21-0228). Top assignees: Asm IP Holding B.v., Asm International N.v., Asm America, Inc.. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Willem Maes. Retrieved from https://idiyas.com/inventor/jan-willem-maes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 107 

% Patents Active = 98.1

 

Average Co-Inventor Count = 4.5

ph-index = 22

Forward Citations = 5,209(Granted Patents)

Forward Citations (Not Self Cited) = 4,677(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Heverlee, BE (2005)
  • Hevelee, BE (2004 - 2008)
  • Almere, NL (2013)
  • Leuven, BG (2016 - 2018)
  • Herselt, BE (2018)
  • Wilrijk, BE (2004 - 2024)
  • Leuven, BE (2018 - 2024)

Company Filing History:


Years Active: 2004-2026

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Areas of Expertise:
Thin Film Deposition
Selective Passivation
Atomic Layer Deposition
Organic Films
Molybdenum Deposition
Metal Oxide Films
Cobalt Metalization
SiOC Thin Films
Sequential Infiltration Synthesis
Germanium Oxynitride
Dielectric Films
V-NAND Devices
107 patents (USPTO):Explore Patents

Title: Jan Willem Maes: Pioneering Inventor of Wilrijk, BE

Introduction:

Jan Willem Maes is a visionary inventor based in Wilrijk, BE, with a remarkable passion for innovation and a relentless commitment to creating a better world through his groundbreaking inventions.

Latest Patents:

With an impressive portfolio of 87 patents, Jan Willem Maes continues to push the boundaries of innovation. His latest patents include "Atomic layer deposition of III-V compounds to form V-NAND devices," a method for forming a V-NAND device by depositing semiconductive, conductive, or dielectric materials to create a channel. Another recent patent is "Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface," which involves selectively depositing a target film on a metallic surface relative to a passivation film.

Career Highlights:

Throughout his illustrious career, Jan Willem Maes has made significant contributions to the field of innovation. He has worked with renowned companies such as ASM IP Holding B.V. and ASM International N.V., where he has further honed his skills and expertise in inventing cutting-edge technologies.

Collaborations:

Jan Willem Maes has collaborated with esteemed professionals in the industry, including his coworkers Qi Xie and Michael Eugene Givens. Together, they have synergized their talents and knowledge to drive forward groundbreaking inventions and revolutionize the technological landscape.

Conclusion:

In conclusion, Jan Willem Maes stands out as a true pioneer in the world of innovation, with a remarkable track record of success and a passion for creating transformative technologies. His relentless pursuit of excellence and collaborative spirit continue to inspire and shape the future of invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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