The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Aug. 20, 2021
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Shaoren Deng, Ghent, BE;
Andrea Illiberi, Leuven, BE;
Daniele Chiappe, Espoo, FI;
Eva Tois, Espoo, FI;
Giuseppe Alessio Verni, Jodoigne, BE;
Michael Givens, Oud-Heverlee, BE;
Varun Sharma, Helsinki, FI;
Chiyu Zhu, Helsinki, FI;
Shinya Iwashita, Helsinki, FI;
Charles Dezelah, Helsinki, FI;
Viraj Madhiwala, Helsinki, FI;
Jan Willem Maes, Wilrijk, BE;
Marko Tuominen, Helsinki, FI;
Anirudhan Chandrasekaran, Herent, BE;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 3/08 (2006.01); B08B 5/00 (2006.01); C11D 7/02 (2006.01); C11D 7/24 (2006.01); C11D 7/26 (2006.01); C23C 16/02 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02074 (2013.01); B08B 3/08 (2013.01); B08B 5/00 (2013.01); C11D 7/02 (2013.01); C11D 7/245 (2013.01); C11D 7/261 (2013.01); C11D 7/264 (2013.01); C11D 7/265 (2013.01); C23C 16/0227 (2013.01); H01L 21/28562 (2013.01); C11D 2111/22 (2024.01);
Abstract
Methods for cleaning a substrate are disclosed. The substrate comprises a dielectric surface and a metal surface. The methods comprise providing a cleaning agent to the reaction chamber.