Charles Dezelah

This inventor holds 54 USPTO granted patents and 89 published patent applications, primarily in Vanadium Deposition. Top assignee: Asm IP Holding B.v.. Active years: 2022-2026.

USPTO Granted Patents = 54 (Patent Applications = 89)

% Patents Active = 92.6

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 25(Granted Patents)

Company Filing History:

54 out of 1,298

Asm IP Holding B.v.

patents

Years Active: 2022-2026

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Areas of Expertise:

Vanadium Oxide

Boron Nitride

Transition Metal

Silicon Nitride

Epitaxial Layers

Selective Deposition

Copper Iodide

Molybdenum Nitride

Surface Cleaning

Atomic Layer Etching

Patterned Structures

Threshold Voltage Control

54 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12727402 - Method of forming an epitaxial layer (2026-09-01),

2. 12690399 - Methods and systems for filling a gap (2026-07-21),

3. 12686916 - Method, system and apparatus for forming a metal sulfide layer (2026-07-21),

4. 12685118 - Methods and systems for filling a gap (2026-07-14),

5. 12677607 - Vapor deposition processes, reactants and deposition assemblies (2026-07-07),

6. 12652974 - Methods and systems for forming a layer comprising silicon oxide (2026-06-09),

7. 12648420 - Method of forming patterned structures (2026-06-02),

8. 12630924 - Transition metal deposition method (2026-05-19),

9. 12630919 - Compositions for depositing material, synthesis methods and uses (2026-05-19),

10. 12628399 - Methods and systems for forming a layer comprising a group 13 element on a substrate (2026-05-12),

11. 12624450 - Methods for forming and utilizing antimony containing films, and related structures (2026-05-12),

12. 12624448 - Systems, devices, and methods for forming layers comprising a group 14 element, a pnictogen, and a chalcogen (2026-05-12),

13. 12571095 - Low temperature flowable vanadium oxide gap fill (2026-03-10),

14. 12563983 - Method of forming structures including a vanadium or indium layer (2026-02-24),

15. 12550642 - Deposition of boron nitride films using hydrazido-based precursors (2026-02-10),

Title: The Inventor Charles Dezelah from Helsinki, FI

Introduction: Charles Dezelah is a renowned inventor based in Helsinki, Finland, known for his groundbreaking contributions to various technological fields.

Latest Patents: Charles Dezelah holds several patents in the areas of renewable energy, artificial intelligence, and sustainable transportation, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a career spanning over two decades, Charles Dezelah has worked with leading research institutions and technology companies to develop cutting-edge solutions that have revolutionized the industry.

Collaborations: Throughout his career, Charles Dezelah has collaborated with top engineers, scientists, and designers from around the world, fostering a culture of creativity and excellence in all his projects.

Conclusion: Charles Dezelah's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.