The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Dec. 28, 2023
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Paul Chatelain, Tokyo, JP;
Arpita Saha, Cardiff, GB;
David Kurt De Roest, Leuven, BE;
Yoann Tomczak, Leuven, BE;
Charles Dezelah, Helsinki, FI;
Daniele Piumi, Etterbeek, BE;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/18 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45542 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01); C23C 16/56 (2013.01);
Abstract
Systems and methods for forming an antimony containing film on a substrate. Related structures and films are also disclosed. The antimony films are be formed by a plasma enhanced atomic layer deposition process. The antimony films can be utilized as underlayers in EUV lithography processes.