Daniele Piumi

Title: Innovator Spotlight: Daniele Piumi

Introduction: Daniele Piumi is an accomplished inventor based in Etterbeek, Belgium. With a portfolio of five patents, her contributions to the field of material deposition are significant. Piumi is a key figure at ASML IP Holding B.V., where she is devoted to the advancement of plasma-assisted methods and substrate processing technologies.

Latest Patents: Among her latest patents, Daniele has developed innovative methods and systems for depositing a layer using plasma-assisted techniques. These methods include a process that terminates when specific plasma characteristics align with predetermined criteria, optimizing material deposition. Another noteworthy patent focuses on a substrate processing apparatus and method designed to create a sacrificial masking layer. This layer is formed by introducing a first precursor that selectively reacts with either radiation-modified or unmodified portions of a substrate within a reaction chamber.

Career Highlights: In her role at ASML IP Holding B.V., Daniele has demonstrated her expertise in developing cutting-edge technologies that enhance the efficiency and precision of material applications. Her dedication to innovation in the field has enabled her to make substantial contributions to the company's success.

Collaborations: Throughout her career, Daniele has collaborated with talented individuals, including her coworkers David Kurt De Roest and Ivan Zyulkov. These partnerships have fostered a dynamic environment for innovation, allowing for the exchange of ideas that propel advancements in technology.

Conclusion: Daniele Piumi is a prominent inventor whose work reflects a commitment to innovation in material deposition and substrate processing. Her impressive patent portfolio and collaborative efforts mark her as a significant contributor to contemporary technological advancements. As she continues to push the boundaries of research and development, her influence in the field will undoubtedly grow.