The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2023
Filed:
Oct. 08, 2020
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Ivan Zyulkov, Brussels, BE;
David Kurt de Roest, Kessel-Lo, BE;
Yoann Tomczak, Leuven, BE;
Michael Eugene Givens, Phoenix, AZ (US);
Perttu Sippola, Helsinki, FI;
Tatiana Ivanova, Espoo, FI;
Zecheng Liu, Helsinki, FI;
Bokheon Kim, San Jose, CA (US);
Daniele Piumi, Etterbeek, BE;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/027 (2006.01); H01L 21/02 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01L 21/022 (2013.01); H01L 21/0228 (2013.01); H01L 21/0273 (2013.01); H01L 21/02172 (2013.01); H01L 21/02186 (2013.01); H01L 21/02205 (2013.01); H01L 21/02274 (2013.01); H01L 21/0332 (2013.01); H01L 21/3105 (2013.01);
Abstract
Methods of forming structures including a photoresist underlayer and structures including the photoresist underlayer are disclosed. Exemplary methods include forming the photoresist underlayer that includes metal. Techniques for treating a surface of the photoresist underlayer and/or depositing an additional layer overlying the photoresist underlayer are also disclosed.