Yoann Francis Tomczak

Title: Yoann Francis Tomczak: Innovator in Semiconductor Technology

Introduction

Yoann Francis Tomczak is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approaches to material processing and structure formation.

Latest Patents

Tomczak's latest patents include a method of forming a structure and a system for the same. This patent discloses methods and related systems for lithographically defining patterns on a substrate. An exemplary method involves providing a substrate to a reaction chamber, where the substrate comprises a semiconductor and a surface layer made of amorphous carbon. The method further includes forming a barrier layer on the surface layer and depositing a metal-containing layer on the substrate, which comprises oxygen and a metal. Another significant patent is focused on forming a photoresist underlayer and structures that include this underlayer. The methods disclosed include forming a photoresist underlayer that contains metal, along with techniques for treating the surface of the photoresist underlayer and depositing an additional layer over it.

Career Highlights

Tomczak is currently associated with ASML Holding B.V., a leading company in the semiconductor industry. His work at ASML has allowed him to push the boundaries of technology and contribute to advancements in lithography and material science.

Collaborations

Throughout his career, Tomczak has collaborated with talented individuals such as Ivan Zyulkov and David Kurt De Roest. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Yoann Francis Tomczak is a prominent figure in semiconductor innovation, with patents that reflect his expertise and creativity. His contributions continue to influence the industry and pave the way for future advancements.