The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
Aug. 08, 2022
Applicant:
Asm Ip Holding, B.v., Almere, NL;
Inventors:
Yoann Tomczak, Leuven, BE;
Ivan Zyulkov, Brussels, BE;
David Kurt De Roest, Leuven, BE;
Michael Eugene Givens, Oud-Heverlee, BE;
Daniele Piumi, Etterbeek, BE;
Charles Dezelah, Helsinki, FI;
Assignee:
ASM IP Holding, B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76879 (2013.01); G03F 7/0045 (2013.01); G03F 7/2004 (2013.01); H01L 21/0274 (2013.01); H01L 21/28562 (2013.01);
Abstract
Methods of forming patterned features on a surface of a substrate are disclosed. Exemplary methods include gas-phase formation of a layer comprising an oxalate compound on a surface of the substrate. Portions of the layer comprising the oxalate compound can be exposed to radiation or active species that form exposed and unexposed portions. Material can be selectively deposed onto the exposed or the unexposed portions.