Ivan Zyulkov

Title: Ivan Zyulkov: Innovator in Substrate Processing Technologies

Introduction

Ivan Zyulkov is a notable inventor based in Brussels, Belgium. He has made significant contributions to the field of substrate processing, holding a total of three patents. His work focuses on methods and systems that enhance the lithographic definition of patterns on substrates, particularly in semiconductor applications.

Latest Patents

Ivan Zyulkov's latest patents include a method of forming a structure and a substrate processing apparatus and method. The first patent discloses methods and related systems for lithographically defining patterns on a substrate. This exemplary method involves providing a substrate to a reaction chamber, where the substrate comprises a semiconductor and a surface layer made of amorphous carbon. The method further includes forming a barrier layer on the surface layer and depositing a metal-containing layer that comprises oxygen and a metal. The second patent describes a substrate processing method and apparatus designed to create a sacrificial masking layer. This layer is formed by providing a first precursor that selectively reacts with either a radiation-modified or unmodified layer portion on a substrate within a reaction chamber.

Career Highlights

Ivan Zyulkov is currently employed at ASML Holding B.V., a company renowned for its advanced technology in the semiconductor industry. His innovative work has positioned him as a key player in the development of new substrate processing techniques.

Collaborations

Throughout his career, Ivan has collaborated with notable professionals in the field, including David Kurt De Roest and Daniele Piumi. These collaborations have further enriched his research and development efforts.

Conclusion

Ivan Zyulkov is a distinguished inventor whose work in substrate processing technologies has led to significant advancements in the semiconductor industry. His innovative patents reflect his expertise and commitment to enhancing lithographic methods.