The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Jan. 04, 2022
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Zecheng Liu, Kanagawa, JP;

Takashi Yoshida, Fuchu, JP;

Ryu Nakano, Kanagawa, JP;

Ivan Zyulkov, Brussels, BE;

Yiting Sun, Leuven, BE;

Yoann Francis Tomczak, Leuven, BE;

David De Roest, Kessel-Lo, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/02 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 16/0272 (2013.01); C23C 16/45536 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01J 37/32449 (2013.01); H01L 21/02164 (2013.01); H01L 21/02183 (2013.01); H01L 21/02186 (2013.01); H01L 21/02252 (2013.01); H01L 21/0228 (2013.01); H01J 2237/332 (2013.01);
Abstract

Methods and related systems for lithographically defining patterns on a substrate are disclosed. An exemplary method includes forming a structure. The method includes providing a substrate to a reaction chamber. The substrate comprises a semiconductor and a surface layer. The surface layer comprises amorphous carbon. The method further comprises forming a barrier layer on the surface layer and depositing a metal-containing layer on the substrate. The metal-containing layer comprises oxygen and a metal.


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