Zecheng Liu

Title: Zecheng Liu: Innovator in Semiconductor Technology

Introduction

Zecheng Liu is a prominent inventor based in Kanagawa, Japan, known for his significant contributions to semiconductor technology. With a total of five patents to his name, Liu has made remarkable advancements in methods related to lithography and material deposition.

Latest Patents

Liu's latest patents include innovative methods for forming structures and systems that enhance the lithographic definition of patterns on substrates. One notable patent describes a method that involves providing a substrate with a semiconductor and a surface layer made of amorphous carbon. This method includes forming a barrier layer on the surface layer and depositing a metal-containing layer that comprises both oxygen and a metal. Another significant patent focuses on the formation of a silicon oxycarbide layer on a substrate's surface. This method utilizes an oxygen-free reactant and involves multiple deposition cycles, each incorporating a silicon precursor and pulsed plasma power to create the silicon oxycarbide layer.

Career Highlights

Zecheng Liu is currently associated with ASML IP Holding B.V., a company renowned for its cutting-edge technology in the semiconductor industry. His work has been instrumental in advancing the capabilities of lithographic processes, which are crucial for the production of integrated circuits.

Collaborations

Liu has collaborated with notable colleagues in his field, including Viljami J. Pore and Takashi Yoshida. These collaborations have further enriched his research and development efforts, leading to innovative solutions in semiconductor technology.

Conclusion

Zecheng Liu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in lithography and material science, making a lasting impact on the industry.