Yiting Sun

Title: Yiting Sun: Innovator in Semiconductor Technologies

Introduction

Yiting Sun is a prominent inventor based in Leuven, Belgium. She has made significant contributions to the field of semiconductor technologies, holding 2 patents that showcase her innovative approaches.

Latest Patents

Yiting Sun's latest patents include a "Method of forming a structure and system for same" and a "Method for activating a porous layer surface." The first patent discloses methods and related systems for lithographically defining patterns on a substrate. An exemplary method involves providing a substrate to a reaction chamber, where the substrate comprises a semiconductor and a surface layer made of amorphous carbon. The method further includes forming a barrier layer on the surface layer and depositing a metal-containing layer that comprises oxygen and a metal. The second patent outlines a method for activating an exposed surface of a porous dielectric layer. This method involves filling the pores of the porous dielectric layer with a first liquid, selectively removing the first liquid from the surface, activating the exposed surface, and then removing the first liquid from the bulk part of the porous dielectric layer.

Career Highlights

Throughout her career, Yiting Sun has worked with notable organizations such as Imec Vzw and Katholieke Universiteit Leuven, also known as KU Leuven R&D. Her work in these institutions has allowed her to advance her research and contribute to the development of innovative technologies.

Collaborations

Yiting has collaborated with esteemed colleagues, including Quoc Toan Le and Mikhail Rodionovich Baklanov. These collaborations have further enriched her research and innovation efforts.

Conclusion

Yiting Sun is a remarkable inventor whose work in semiconductor technologies has led to significant advancements. Her patents reflect her dedication to innovation and her impact on the field.