The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Dec. 07, 2021
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Daniele Piumi, Etterbeek, BE;
Pamela Rene Fischer, Portland, OR (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/509 (2006.01); C23C 16/52 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); C23C 16/4408 (2013.01); C23C 16/45525 (2013.01); C23C 16/45565 (2013.01); C23C 16/4586 (2013.01); C23C 16/46 (2013.01); C23C 16/509 (2013.01); C23C 16/52 (2013.01); H01J 37/32128 (2013.01); H01J 37/32724 (2013.01); H01J 37/32935 (2013.01); H01J 2237/332 (2013.01);
Abstract
Plasma-assisted methods for depositing materials and related systems are described. The methods described herein comprise ending a deposition process when a plasma characteristic matches a pre-determined criterion.