Cardiff, United Kingdom

Arpita Saha

This inventor holds 1 USPTO granted patent. Top assignee: Asm IP Holding B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Arpita Saha. Retrieved from https://idiyas.com/inventor/arpita-saha-abo7331r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Arpita Saha: Innovator in Antimony Containing Films

Introduction

Arpita Saha is a notable inventor based in Cardiff, GB. He has made significant contributions to the field of materials science, particularly in the development of antimony containing films. His innovative work has implications for advanced lithography processes.

Latest Patents

Arpita Saha holds a patent titled "Methods for forming and utilizing antimony containing films, and related structures." This patent describes systems and methods for forming an antimony containing film on a substrate. The antimony films are formed by a plasma enhanced atomic layer deposition process. These films can be utilized as underlayers in extreme ultraviolet (EUV) lithography processes.

Career Highlights

Arpita Saha is currently employed at Asm IP Holding B.V., where he continues to advance his research and development efforts. His work is characterized by a commitment to innovation and excellence in the field of materials engineering.

Collaborations

Arpita collaborates with various professionals in his field, including his coworker Paul Chatelain. Their combined expertise contributes to the advancement of technologies related to antimony films.

Conclusion

Arpita Saha's contributions to the field of antimony containing films highlight his role as an innovative inventor. His work not only enhances the understanding of materials science but also paves the way for advancements in lithography technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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