The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Aug. 31, 2022
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Hannu Huotari, Helsinki, FI;

Daniele Piumi, Etterbeek, BE;

Yoann Tomczak, Leuven, BE;

Ivan Zyulkov, Brussels, BE;

Charles Dezelah, Helsinki, FI;

Arpita Saha, Espoo, FI;

David De Roest, Leuven, BE;

Jerome Innocent, Leuven, BE;

Michael Givens, Oud-Heverlee, BE;

Monica Thukkaram, Ghent, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); G03F 7/167 (2013.01); G03F 7/2004 (2013.01);
Abstract

Methods of forming structures including a photoresist absorber layer and structures including the photoresist absorber layer are disclosed. Exemplary methods include forming the photoresist absorber layer that includes at least two elements having an EUV cross section (σα) of greater than 2×10cm/mol.


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Huotari, Hannu. (2026). Method of forming a photoresist absorber layer and structure including same (U.S. Patent No. 12782815). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12782815

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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