Helsinki, Finland

Hannu Huotari

USPTO Granted Patents = 46 

Average Co-Inventor Count = 2.8

ph-index = 16

Forward Citations = 3,605(Granted Patents)


Location History:

  • Espo, FI (2011 - 2015)
  • Espoo, FI (2005 - 2022)
  • Helsinki, FI (2018 - 2024)

Company Filing History:


Years Active: 2005-2025

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46 patents (USPTO):

Title: Hannu Huotari: Pioneering Innovations in Vapor Phase Deposition

Introduction: Hannu Huotari, based in Helsinki, Finland, is an eminent inventor with a remarkable portfolio boasting 42 patents. His contributions to the field of vapor phase deposition of organic films reflect his expertise and innovative spirit.

Latest Patents: Among Huotari's latest patents is a groundbreaking method for vapor deposition of organic films. This innovative process involves vaporizing an organic reactant at a first temperature, transporting the vapor to a chamber containing a substrate, and keeping the substrate at a lower temperature than the vaporization temperature. Through alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence, his methodology enables the bottom-up filling of voids and trenches with organic film, achieving results that are otherwise challenging to realize.

Career Highlights: Huotari has made significant strides in his career, working with prominent companies such as ASM IP Holding B.V. and ASM International N.V. His extensive experience in these organizations has contributed to the refinement and development of his patented technologies in vapor deposition.

Collaborations: Throughout his career, Huotari has collaborated with distinguished colleagues, including Marko J. Tuominen and Viljami J. Pore. These collaborations have been instrumental in driving innovation and enhancing the achievements that Huotari is celebrated for today.

Conclusion: Hannu Huotari's work exemplifies the essence of innovation in the field of organic film deposition. His 42 patents illustrate his commitment to advancing technology and his influence in the industry. As he continues to develop new methods and techniques, the impact of his contributions will undoubtedly resonate within the scientific community and beyond.

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