The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Sep. 27, 2022
Asm Ip Holding B.v., Almere, NL;
Hannu Huotari, Helsinki, FI;
Viljami Pore, Helsinki, FI;
Timothee Blanquart, Oud-Heverlee, BE;
René Henricus Jozef Vervuurt, Leuven, BE;
Charles Dezelah, Helsinki, FI;
Giuseppe Alessio Verni, Jodoigne, BE;
Ren-Jie Chang, Leuven, BE;
Michael Givens, Oud-Heverlee, BE;
Eric James Shero, Phoenix, AZ (US);
ASM IP Holding B.V., Almere, NL;
Abstract
A multiple-layer method for forming material within a gap on a surface of a substrate is disclosed. An exemplary method includes forming a layer of first material overlying the substrate and forming a layer of second (e.g., initially flowable) material within a region of the first material to thereby at least partially fill the gap with material in a seamless and/or void less manner.